Hazardous Product

82009, Novolack, O-Naphto-Chinon-Diazide Etching Chemical for Etching in Liquid

RS Stock No.: 173-886Brand: Kontakt ChemieManufacturers Part No.: 82009
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Technical documents

Specifications

Process Type

Etching

Material

Novolack, O-Naphto-Chinon-Diazide

Ferric Chloride Form

Liquid

Trade Name

POSITIV 20

Country of Origin

Belgium

Product details

KONTAKT POSITIV 20 - positive photo-sensitive lacquer

Positive photo-sensitive lacquer for manufacturing printed circuit boards, with clear copper tracks laminated onto epoxy FR4 or Bakelite.
Positive work: can be used with a Mylar transparent film or a single traced design; the printed circuit diagram is always the image of the original positive.
Blue sensitive layer is resistant to etching agents when not insulated.
Perfectly uniform, even layer.

Stock information temporarily unavailable.

Please check again later.

Stock information temporarily unavailable.

£ 21.62

Each (ex VAT)

82009, Novolack, O-Naphto-Chinon-Diazide Etching Chemical for Etching in Liquid

Please note: Hazardous items will incur an additional delivery charge and have a much longer lead time. Please contact us for further details.

£ 21.62

Each (ex VAT)

82009, Novolack, O-Naphto-Chinon-Diazide Etching Chemical for Etching in Liquid
Stock information temporarily unavailable.

Please note: Hazardous items will incur an additional delivery charge and have a much longer lead time. Please contact us for further details.

Technical documents

Specifications

Process Type

Etching

Material

Novolack, O-Naphto-Chinon-Diazide

Ferric Chloride Form

Liquid

Trade Name

POSITIV 20

Country of Origin

Belgium

Product details

KONTAKT POSITIV 20 - positive photo-sensitive lacquer

Positive photo-sensitive lacquer for manufacturing printed circuit boards, with clear copper tracks laminated onto epoxy FR4 or Bakelite.
Positive work: can be used with a Mylar transparent film or a single traced design; the printed circuit diagram is always the image of the original positive.
Blue sensitive layer is resistant to etching agents when not insulated.
Perfectly uniform, even layer.